• Stability of zirconium silicate films on Si under vacuum and O/sub 2/ annealing 

      Morais, Jonder; Rosa, Elisa Brod Oliveira da; Miotti, Leonardo; Pezzi, Rafael Peretti; Baumvol, Israel Jacob Rabin; Rotondaro, Antonio L.P.; Bevan, M.J.; Colombo, Luigi (2001) [Artigo de periódico]
      The effect of postdeposition annealing in vacuum and in dry O2 on the atomic transport and chemical stability of chemical vapor deposited ZrSixOy films on Si is investigated. Rutherford backscattering spectrometry, narrow ...
    • Thermal behavior of hafnium-based ultrathin films on silicon 

      Pezzi, Rafael Peretti; Morais, Jonder; Dahmen, Silvio Renato; Bastos, Karen Paz; Miotti, Leonardo; Soares, Gabriel Vieira; Baumvol, Israel Jacob Rabin; Freire Junior, Fernando Lazaro (2003) [Artigo de periódico]
      We report here on the thermodynamical stability of ultrathin, hafnium-based dielectric films, namely hafnium oxide (HfO2), silicate (HfSixOy), and aluminum silicate (AlHfxSiyOz), deposited on silicon. These materials are ...
    • Thermal stability and diffusion in gadolinium silicate gate dielectric films 

      Landheer, Dolf; Wu, Xiaohua; Morais, Jonder; Baumvol, Israel Jacob Rabin; Pezzi, Rafael Peretti; Miotti, Leonardo; Lennard, W.N.; Kim, Joon-Kon (2001) [Artigo de periódico]
      Gadolinium silicate films on Si(100) annealed in oxygen and vacuum at temperatures up to 800 °C were analyzed by Rutherford backscattering and narrow resonance nuclear profiling. Oxygen diffused into the film eliminating ...
    • Thermal stability of dielectrics on germanium : role of the substrate 

      Soares, Gabriel Vieira; Baumvol, Israel Jacob Rabin; Radtke, Claudio (2013) [Resumo publicado em evento]
    • Thermal stability of plasma-nitrided aluminum oxide films on Si 

      Bastos, Karen Paz; Pezzi, Rafael Peretti; Miotti, Leonardo; Soares, Gabriel Vieira; Driemeier, Carlos Eduardo; Morais, Jonder; Baumvol, Israel Jacob Rabin; Hinkle, C.; Lucovsky, Gerald (2004) [Artigo de periódico]
      The effect of post-deposition rapid thermal annealing in vacuum and in dry O2 on the stability of remote plasma-assisted nitrided aluminum oxide films on silicon is investigated. The areal densities of Al, O, N, and Si ...
    • Thermal stability of soy-based polyurethanes 

      Monteavaro, Luciane Lemos; Riegel, Izabel Cristina; Petzhold, Cesar Liberato; Samios, Dimitrios (2005) [Artigo de periódico]
      New types of polyurethanes were prepared by reacting diisocyanates and formiated soy polyols with different OH functionalities. Thermal properties and degradation kinetics were investigated by TGA. All prepared PU’s showed ...
    • Transporte atômico e estabilidade em dielétricos alternativos para a tecnologia do Si 

      Miotti, Leonardo (2007) [Tese]
      Esta tese trata do estudo experimental de fenômenos de transporte atômico e reação química em filmes ultra-finos dielétricos sobre Si. Esses dielétricos são materiais alternativos ao óxido de silício utilizado em dispositivos ...
    • Transporte atômico e incorporação de oxigênio em filmes de HfSiO e HfSiON depositados sobre Si 

      Miotti, Leonardo (2004) [Dissertação]
      Esse trabalho estuda a estabilidade térmica e o transporte atômico em filmes dielétricos de HfSiO e HfSiON depositados por sputtering reativo sobre c-Si. Esses materiais possuem alta constante dielétrica (high- ) e são ...
    • Two-step purification and partial characterization of keratinolytic proteases from feather meal bioconversion by Bacillus sp. P45 

      Lemes, Ailton César; Gautério, Gabrielle Victória; Rosa, Cezar Augusto da; Brandelli, Adriano; Kalil, Susana Juliano (2023) [Artigo de periódico]
      This study aimed to purify and partially characterize a keratinolytic protease produced by Bacillus sp. P45 through bioconversion of feather meal. Crude protease extract was purified using a sequence of an aqueous two-phase ...