High resolution profiling using ion scattering and resonant nuclear reactions
dc.contributor.author | Pezzi, Rafael Peretti | pt_BR |
dc.contributor.author | Wallace, Robert M. | pt_BR |
dc.contributor.author | Copel, Matthew | pt_BR |
dc.contributor.author | Baumvol, Israel Jacob Rabin | pt_BR |
dc.date.accessioned | 2016-07-27T02:18:00Z | pt_BR |
dc.date.issued | 2005 | pt_BR |
dc.identifier.uri | http://hdl.handle.net/10183/144010 | pt_BR |
dc.format.mimetype | application/pdf | |
dc.language.iso | eng | pt_BR |
dc.relation.ispartof | AIP conference proceedings. New York | pt_BR |
dc.rights | Open Access | en |
dc.subject | Circuitos integrados | pt_BR |
dc.subject | Depth profiling | en |
dc.subject | Eletrônica | pt_BR |
dc.subject | Medium energy ion scattering | en |
dc.subject | Resonant nuclear reaction analysis | en |
dc.title | High resolution profiling using ion scattering and resonant nuclear reactions | pt_BR |
dc.type | Trabalho completo publicado em evento | pt_BR |
dc.contributor.event | Characterizations and Metrology for ULSI Technology ( 2005 : Richardson, Texas) | pt_BR |
dc.identifier.nrb | 000560098 | pt_BR |
dc.type.origin | Estrangeiro | pt_BR |
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