Growth kinetics of solid-state-reacted fe-zr multilayer films
dc.contributor.author | Paesano Junior, Andrea | pt_BR |
dc.contributor.author | Teixeira, Sergio Ribeiro | pt_BR |
dc.contributor.author | Amaral, Livio | pt_BR |
dc.date.accessioned | 2014-05-17T02:06:49Z | pt_BR |
dc.date.issued | 1991 | pt_BR |
dc.identifier.issn | 0021-8979 | pt_BR |
dc.identifier.uri | http://hdl.handle.net/10183/95349 | pt_BR |
dc.description.abstract | Multilayers of Fee0.33Zr0.67, prepared by electron beam evaporation, have been characterized by conversion electron Mijssbauer spectroscopy, Rutherford backscattering spectroscopy, and x-ray diffraction. Two phases, one amorphous and another crystalline (FeZr3), occur by solid-state reaction. For temperatures of 350 and 500 °C and annealing times ranging from 10 min to 72 h the growth rates of both phases had been obtained. From these results we suggest a model to describe the phase growth kinetics of the amorphouscrystalline Fe0.33Zr0.67 multilayer thin film. | en |
dc.format.mimetype | application/pdf | pt_BR |
dc.language.iso | eng | pt_BR |
dc.relation.ispartof | Journal of Applied Physics. Woodbury. Vol. 70, n. 9 (Nov. 1991), p. 4870-4876 | pt_BR |
dc.rights | Open Access | en |
dc.subject | Implantação de íons | pt_BR |
dc.subject | Efeito mossbauer | pt_BR |
dc.subject | Retroespalhamento rutherford | pt_BR |
dc.subject | Raios X | pt_BR |
dc.subject | Filmes finos | pt_BR |
dc.title | Growth kinetics of solid-state-reacted fe-zr multilayer films | pt_BR |
dc.type | Artigo de periódico | pt_BR |
dc.identifier.nrb | 000055570 | pt_BR |
dc.type.origin | Estrangeiro | pt_BR |
Este item está licenciado na Creative Commons License
-
Artigos de Periódicos (41542)Ciências Exatas e da Terra (6257)